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In The News
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July 2008
Memory and Logic Divergence and its Impact on IC Equipment
Published in: VLSI Research, Inc July 23, 2008
Novellus Cuts The Extras To Fight Demand Woes, Stock Slide
Published in: Smart Money July 15, 2008
Novellus Debuts Deposition Tools During West
Published in: Semiconductor International July 15, 2008
Novellus CEO Says No to 450-mm
Published in: EE Times July 15, 2008
Novellus Execs Lay Out Case for Industry, Market Growth Opportunities
Published in: Solid State Technology July 15, 2008
Semiconductor Suppliers Hit by Downturn
Published in: The Wall Street Journal July 10, 2008
May 2008
Novellus tips strip clean tools for logic, memory
Published in: Solid State Technology May 20, 2008
Novellus Offers Dry Strip Tools for High-Volume Memory, Advanced Logic
Published in: Semiconductor International May 19, 2008
Self-Aligned Barrier Improves Interconnect Reliability
Published in: Semiconductor International May 1, 2008
April 2008
Novellus Realizes Benefits Of Early Supplier Involvement
Published in: Semiconductor International April 10, 2008
Global Competition Demands New Models, Policies
Published in: Semiconductor International April 8, 2008
March 2008
Novellus seeks mindshare amid IC lull
Published in: EE Times March 17, 2008
February 2008
IITC process units and integration
Published in: SST Online February 11, 2008
December 2007
Novellus Beefs Up Tool Supply Chain
Published in: Solid State Technology December 6, 2007
Trailing-Edge Fabs in Japan Hot on Refurbished Tools, Says Novellus
Published in: Fabtech December 5, 2007
Novellus Expands Refurbished Sector
Published in: EuroAsia Semiconductor December 5, 2007
450 mm: One Man's View
Published in: Semiconductor International December 1, 2007
October 2007
PVD Technology
Published in: Semiconductor International October 15, 2007
PECVD Thin-Film Processing Platform
Published in: Semiconductor International October 15, 2007
Copper Barriers Hold Up Under Stress
Published in: Semiconductor International October 1, 2007
Interconnect Metrology Confidently Looks at 32 nm
Published in: Semiconductor International October 1, 2007
September 2007
Silicon Valley Executives Join Push For Plug-In Hybrids
Published in: San Jose Mercury News September 23, 2007
Lam, Novellus Take Two Paths to Strip Wafer Edges
Published in: Solid State Technology September 11, 2007
PECVD System
Published in: Semiconductor International September 1, 2007
August 2007
New Product: Novellus enters 300mmPrime time with Vector Extreme
Published in: Semiconductor Fabtech August 22, 2007
Tougher choices in capital equipment
Published in: Electronic News August 17, 2007
PECVD Platform
Published in: Semiconductor International August 8, 2007
Edge Treatment Important for Hard Masks
Published in: Semiconductor International August 1, 2007
July 2007
Novellus Targets Equipment at Memory Mega Fabs
Published in: Semiconductor International July 20, 2007
Novellus Addresses the Rapid Transformation of the Semiconductor Industry
Published in: VLSI Research, Inc July 19, 2007
Novellus Sees Bright Future After Waning Memory Capex, But No Solar Flare
Published in: Solid State Technology July 18, 2007
Technology, Economic Challenges May Inhibit 32 nm Adoption
Published in: Semiconductor International July 18, 2007
Novellus Posts Results, Rolls Tools
Published in: EE Times July 16, 2007
Novellus Pushes Memory Wafer Throughput With Modularized PECVD Tool
Published in: Electronic News July 16, 2007
Hill: A big chip off the semiconductor block
Published in: San Jose Mercury News July 15, 2007
The Changing Supply Chain
Published in: Semiconductor International July 1, 2007
June 2007
New Product: Ashable hard mask process from Novellus targets high aspect ratio etch
Published in: Semiconductor Fabtech June 28, 2007
Novellus adds capabilities to CVD tool
Published in: EE Times June 25, 2007
Novellus extends 193-nm high aspect patterning etch
Published in: Electronic News June 25, 2007
Thin Is In With Novellus & Apos; Vector Express
Solid State Technology
Published in: Electronics Blog June 8, 2007
May 2007
Novellus makes energy conservation a priority
Published in:Tualatin Times May 17, 2007
April 2007
Robert Handa Reports from Silicon Valley
Media: Channel Two (KTVU) April 20, 2007
Novellus Extends PECVD Technologyto the 45nm Node With Higher Productivity
Published in: Semiconductor Fabtech April 4, 2007
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